Asml 5500 manual

ASML : ASM Lithography - PAS 5500/400, Step & Scan System - ASML's Total Step and Scan Solution for sub 0.25Um Applications This video will be training for the ASML PAS 5500/300C DUV stepper. This is a completely automated tool, a production level tool; it requires little user interaction. There are several steps that you'll need to understand well. We're going to go through those. Please note there's a lot of required reading for this. ASML User Operation Note: Failure to follow these guidelines will result in tool access revocation! 1) Reticles (photo masks) must be absolutely clean, with NO CONTAMINATION of ASML manual. Select the Reticle ID. This should be done automatically if the correct reticle is loaded. Enter Energy and Focus Offset values. If you are exposing a This manual provides information on creating a focus exposure matrix on the ASML 5500/300. A focus exposure matrix is typically used to determine the best combination of exposure dose and focus used during the exposure step for a specific design. Material Controls & Compatibility. The ASML 5500/300 is configured to process 6-inch Si wafers. About Press Copyright Contact us Creators Advertise Developers Terms Privacy Policy & Safety How YouTube works Test new features Press Copyright Contact us Creators Users manuals Links Pictures gallery I. Introduction The ASML PAS 5500/350C stepper is a photolithography equipment, using DUV light from a KrF laser source (248 nm) to expose photoresist through a mask, generally referred as the "reticle". Lithography System -- PAS 5500/100D Supplier's Site Email Supplier The pas 5500/100D i-line stepper is designed for mass production at 0.4μm and achieves extremely high throughput while maintaining the utmost versatility with its variable Numerical Aperture (NA). » asml pas 5500 coach download » инструкция hp officejet 5500 series » officejet 5500 » logitech mx 5500 driver windows 7 pt » asio driver denon 5500 » asdm 5500 ランチャ ダウンロード » hp officejet 5500 driver xp » asio driver 5500 player » 10.3.5500.0 sql server microsoft » hp photosmart 5500 drivers This projection printer uses a DUV (248nm) lens column (0.63 N.A.) to provide a 4:1 reduction with an exposure field size up to 22mm square. Minimum feature size is <0.20µm. The number and placement of the dies is programmable. Wafer sizes of 3" up to 200mm can be accommodated, and pieces with significant effort. 4.1 General Description - T he ASML PAS 5500/200 is a 5 x reduction, i-line step per set up for. exposure of 6 inch wafers using 6 inch reticles. The sy stem has 350nm resolution with a. 0.48-0.60 variable n umerical aperture. The maximum field size on the wafer is 22x22mm. Overlay capability is better than 50nm. File Type PDF Introduction To Asml Pas 5500 Wafer Alignment And Zero Exposure Coat 2003 dodge neon owners manual , wordly wise 3000 a teacher answer key , power wheels f150 owners manual , free kia rio repair manual , alpine cda 7840 owners manual , life science common paper 2014 , free downloads of buick rendez vous 2004 manual guide , hhr ASML PAS 5500/60 i-line Stepper Training . Lab Facility: SNF Cleanroom. Training Charges: 4.00 hours. Primary Trainer: Cliff Knollenberg. Primary Maintenance: Gary Sosa. Backup Maintenance: Mario Vilanova. Steps to become a tool user. Become a member of SNF. File Type PDF Introduction To Asml Pas 5500 Wafer Alignment And Zero Exposure Coat 2003 dodge neon owners manual , wordly wise 3000 a teacher answer key , power wheels f150 owners manual , fr